The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Sep. 12, 2008
Isaac Mazor, Haifa, IL;
Alex Dikopoltsev, Haifa, IL;
Boris Yokhin, Nazareth Illit, IL;
Dileep Agnihotri, Round Rock, TX (US);
Tzachi Rafaeli, Givat Shimshit, IL;
Alex Tokar, Haifa, IL;
David Berman, Kiryat Tivon, IL;
Moshe Beylin, Nahariya, IL;
Isaac Mazor, Haifa, IL;
Alex Dikopoltsev, Haifa, IL;
Boris Yokhin, Nazareth Illit, IL;
Dileep Agnihotri, Round Rock, TX (US);
Tzachi Rafaeli, Givat Shimshit, IL;
Alex Tokar, Haifa, IL;
David Berman, Kiryat Tivon, IL;
Moshe Beylin, Nahariya, IL;
Jordan Valley Semiconductors Ltd., Migdal Ha'emek, IL;
Abstract
The computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective location. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected location.