The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Oct. 15, 2003
David J. Kubista, Nampa, ID (US);
Trung T. Doan, Pflugerville, TX (US);
Lyle D. Breiner, Meridian, ID (US);
Ronald A. Weimer, Boise, ID (US);
Kevin L. Beaman, Boise, ID (US);
Er-xuan Ping, Meridian, ID (US);
Lingyi A. Zheng, Boise, ID (US);
Cem Basceri, Boise, ID (US);
David J. Kubista, Nampa, ID (US);
Trung T. Doan, Pflugerville, TX (US);
Lyle D. Breiner, Meridian, ID (US);
Ronald A. Weimer, Boise, ID (US);
Kevin L. Beaman, Boise, ID (US);
Er-Xuan Ping, Meridian, ID (US);
Lingyi A. Zheng, Boise, ID (US);
Cem Basceri, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers are disclosed herein. In one embodiment, the system includes a gas phase reaction chamber, a first exhaust line coupled to the reaction chamber, first and second traps each in fluid communication with the first exhaust line, and a vacuum pump coupled to the first exhaust line to remove gases from the reaction chamber. The first and second traps are operable independently to individually and/or jointly collect byproducts from the reaction chamber. It is emphasized that this Abstract is provided to comply with the rules requiring an abstract. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.