The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
Mar. 31, 2003
Takuya Sugawara, Nirasaki, JP;
Yoshihide Tada, Nirasaki, JP;
Genji Nakamura, Nirasaki, JP;
Shigenori Ozaki, Amagasaki, JP;
Toshio Nakanishi, Amagasaki, JP;
Masaru Sasaki, Amagasaki, JP;
Seiji Matsuyama, Amagasaki, JP;
Kazuhide Hasebe, Nirasaki, JP;
Shigeru Nakajima, Nirasaki, JP;
Tomonori Fujiwara, Nirasaki, JP;
Takuya Sugawara, Nirasaki, JP;
Yoshihide Tada, Nirasaki, JP;
Genji Nakamura, Nirasaki, JP;
Shigenori Ozaki, Amagasaki, JP;
Toshio Nakanishi, Amagasaki, JP;
Masaru Sasaki, Amagasaki, JP;
Seiji Matsuyama, Amagasaki, JP;
Kazuhide Hasebe, Nirasaki, JP;
Shigeru Nakajima, Nirasaki, JP;
Tomonori Fujiwara, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The surface of an insulating film disposed on an electronic device substrate is irradiated with plasma based on a process gas comprising at least an oxygen atom-containing gas, to thereby form an underlying film at the interface between the insulating film and the electronic device substrate. A good underlying film is provided at the interface between the insulating film and the electronic device substrate, so that the thus formed underlying film can improve the property of the insulating film.