The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Jul. 19, 2007
Mayuka Oosaki, Yokohama, JP;
Chie Shishido, Kawasaki, JP;
Maki Tanaka, Yokohama, JP;
Hiroki Kawada, Tsuchiura, JP;
Mayuka Oosaki, Yokohama, JP;
Chie Shishido, Kawasaki, JP;
Maki Tanaka, Yokohama, JP;
Hiroki Kawada, Tsuchiura, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In the case of monitoring a resolution of a scanning electron microscope, it is required to prepare a sample and to use a measuring algorithm so as to reduce the pattern dependency of an index value of resolution to be measured in order to measure a variation in the size of an electron beam with a high degree of accuracy. According to the present invention, there is used a sample having a sectional shape which is appropriate for monitoring the resolution, that is, the sample has a pattern with such a sectional shape that a side wall of the pattern is inclined so as to prevent an electron beam irradiated on the sample from impinging upon the side wall of the pattern. With this configuration, it is possible carry out such resolution monitor that does not depend upon a sectional shape of a pattern.