The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
Jun. 28, 2006
Ji Zhu, El Cerrito, CA (US);
Seokmin Yun, Pleasanton, CA (US);
Mark Wilcoxson, Oakland, CA (US);
John DE Larios, Palo Alto, CA (US);
Ji Zhu, El Cerrito, CA (US);
Seokmin Yun, Pleasanton, CA (US);
Mark Wilcoxson, Oakland, CA (US);
John de Larios, Palo Alto, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for cleaning the surface of a semiconductor wafer is disclosed. A first cleaning solution is applied to the wafer surface to remove contaminants on the wafer surface. The first cleaning solution is removed with some of the contaminants on the wafer surface. Next, an oxidizer solution is applied to the wafer surface. The oxidizer solution forms an oxidized layer on remaining contaminants. The oxidizer solution is removed and then a second cleaning solution is applied to the wafer surface. The second cleaning solution is removed from the wafer surface. The cleaning solution is configured to substantially remove the oxidized layer along with the remaining contaminants.