The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2009
Filed:
Mar. 12, 2008
Alexander N. Bykanov, San Diego, CA (US);
J. Martin Algots, San Diego, CA (US);
Oleh V. Khodykin, San Diego, CA (US);
Oscar Hemberg, Stockholm, SE;
Norbert R. Bowering, San Diego, CA (US);
Alexander N. Bykanov, San Diego, CA (US);
J. Martin Algots, San Diego, CA (US);
Oleh V. Khodykin, San Diego, CA (US);
Oscar Hemberg, Stockholm, SE;
Norbert R. Bowering, San Diego, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.