The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2009
Filed:
Jul. 28, 2004
Kaoru Yamada, Tokyo, JP;
Takayuki Saito, Fujisawa, JP;
Sumio Yabe, Tokyo, JP;
Kenya Ito, Tokyo, JP;
Masayuki Kamezawa, Tokyo, JP;
Masaya Seki, Tokyo, JP;
Ichiro Katakabe, Tokyo, JP;
Yuki Inoue, Tokyo, JP;
Kaoru Yamada, Tokyo, JP;
Takayuki Saito, Fujisawa, JP;
Sumio Yabe, Tokyo, JP;
Kenya Ito, Tokyo, JP;
Masayuki Kamezawa, Tokyo, JP;
Masaya Seki, Tokyo, JP;
Ichiro Katakabe, Tokyo, JP;
Yuki Inoue, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
A substrate processing apparatus and a substrate processing method is provided for performing a chemical liquid process, a cleaning process, a drying process, or the like while rotating a substrate such as a semiconductor wafer or a liquid crystal substrate. A substrate holding apparatus is provided for holding and rotating a substrate. The substrate processing apparatus for processing a substrate while supplying a fluid to the substrate includes a substrate holder for holding and rotating the substrate, and a holder suction unit for sucking the fluid from the substrate holder. The substrate holding apparatus includes a plurality of rollers which are brought into contact with an edge portion of a substrate so as to hold and rotate the substrate, and at least one moving mechanism for moving the rollers.