The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2009
Filed:
Jun. 15, 2006
Yasutaka Toyoda, Hitachi, JP;
Akiyuki Sugiyama, Hitachinaka, JP;
Ryoichi Matsuoka, Yotsukaido, JP;
Takumichi Sutani, Hitachinaka, JP;
Hidemitsu Naya, Hitachi, JP;
Yasutaka Toyoda, Hitachi, JP;
Akiyuki Sugiyama, Hitachinaka, JP;
Ryoichi Matsuoka, Yotsukaido, JP;
Takumichi Sutani, Hitachinaka, JP;
Hidemitsu Naya, Hitachi, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plurality of layers corresponding to the patterns. Consequently, the apparatus can realize inspection with use of only the pattern of a target layer to be inspected, pattern inspection differently for different layers, or detection of a positional offset between the layers.