The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2009
Filed:
Oct. 13, 2006
Alexander N. Bykanov, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
Oleh Khodykin, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Alexander N. Bykanov, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
Oleh Khodykin, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.