The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2009
Filed:
Dec. 09, 2004
Kenji Suzuki, Guilderland, NY (US);
Emmanuel P. Guidotti, Fishkill, NY (US);
Gerrit J. Leusink, Saltpoint, NY (US);
Masamichi Hara, Clifton Park, NY (US);
Daisuke Kuroiwa, Clifton Park, NY (US);
Sandra G. Malhotra, Beacon, NY (US);
Fenton Mcfeely, Ossining, NY (US);
Robert R. Young, Jr., Straatsburg, NY (US);
Kenji Suzuki, Guilderland, NY (US);
Emmanuel P. Guidotti, Fishkill, NY (US);
Gerrit J. Leusink, Saltpoint, NY (US);
Masamichi Hara, Clifton Park, NY (US);
Daisuke Kuroiwa, Clifton Park, NY (US);
Sandra G. Malhotra, Beacon, NY (US);
Fenton McFeely, Ossining, NY (US);
Robert R. Young, Jr., Straatsburg, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
In a solid precursor evaporation system configured for use in a thin film deposition system, such as thermal chemical vapor deposition (TCVD), a method for preparing one or more trays of solid precursor is described. The solid precursor may be formed on a coating substrate, such as a tray, using one or more of dipping techniques, spin-on techniques, and sintering techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile