The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2009

Filed:

Oct. 07, 2003
Applicants:

Chle Shishido, Yokohama, JP;

Ryo Nakagaki, Kawasaki, JP;

Maki Tanaka, Yokohama, JP;

Kenji Watanabe, Oume, JP;

Yuya Toyoshima, Tokyo, JP;

Inventors:

Chle Shishido, Yokohama, JP;

Ryo Nakagaki, Kawasaki, JP;

Maki Tanaka, Yokohama, JP;

Kenji Watanabe, Oume, JP;

Yuya Toyoshima, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a method of measuring a three dimensional shape of an arbitrary fine pattern on a semiconductor device, an optical measurement system carries out a measurement to obtain cross-section information, and an electron microscope obtains an electron beam image of the arbitrary fine pattern. Plane information and cross-section information obtained from the electron beam image of the arbitrary fine pattern are combined to measure the three dimensional shape of the arbitrary fine pattern.


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