The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2009
Filed:
Sep. 30, 2003
David L. O'meara, Poughkeepsie, NY (US);
Daniel Craig Burdett, West Park, NY (US);
Stephen H. Cabral, Pine Plains, NY (US);
Gert Leusink, Saltpoint, NY (US);
John William Kostenko, LaGrangeville, NY (US);
Cory Wajda, Mesa, AZ (US);
David L. O'Meara, Poughkeepsie, NY (US);
Daniel Craig Burdett, West Park, NY (US);
Stephen H. Cabral, Pine Plains, NY (US);
Gert Leusink, Saltpoint, NY (US);
John William Kostenko, LaGrangeville, NY (US);
Cory Wajda, Mesa, AZ (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method and system for monitoring status of a system component during a process. The method includes exposing a system component to a reactant gas during a process, where the reactant gas is capable of etching the system component material to form an erosion product, and monitoring release of the erosion product during the process to determine status of the system component. Processes that can be monitored include a chamber cleaning process, a chamber conditioning process, a substrate etching process, and a substrate film formation process. The system component can be a consumable system part such as a process tube, a shield, a ring, a baffle, an injector, a substrate holder, a liner, a pedestal, a cap cover, an electrode, and a heater, any of which can further include a protective coating. The processing system includes the system component in a process chamber, a gas injection system for introducing the reactant gas, a chamber protection system for monitoring the status of the system component, and a controller for controlling the processing system in response to the status.