The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2008
Filed:
Jul. 24, 2007
Takashi Hiroi, Yokohama, JP;
Masahiro Watanabe, Yokohama, JP;
Chie Shishido, Yokohama, JP;
Aritoshi Sugimoto, Tokyo, JP;
Maki Tanaka, Yokohama, JP;
Hiroshi Miyai, Hitachi, JP;
Asahiro Kuni, Tokyo, JP;
Yasuhiko Nara, Hitachinaka, JP;
Takashi Hiroi, Yokohama, JP;
Masahiro Watanabe, Yokohama, JP;
Chie Shishido, Yokohama, JP;
Aritoshi Sugimoto, Tokyo, JP;
Maki Tanaka, Yokohama, JP;
Hiroshi Miyai, Hitachi, JP;
Asahiro Kuni, Tokyo, JP;
Yasuhiko Nara, Hitachinaka, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A pattern inspection apparatus including: an image detecting part for detecting a digital image of an object substrate; a display having a screen on which the digital image of the object substrate and/or a distribution of defect candidates in a map form are displayable; an input device for inputting information of a non-inspection region to be masked on the object substrate by defining a region on the screen on which said distribution of defect candidates is displayed in a map form; a memory part for storing coordinate data, pattern data or feature quantity data of the non-inspection region to be masked on the object substrate inputted on the screen by the input device; and a defect judging part in which the digital image detected by the image detecting part is examined in a state that a region matching with a condition stored in the memory part is masked and a defect is detected in a region other than said masked region.