The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Nov. 29, 2004
Eric G. Webb, Salem, OR (US);
Jonathan D. Reid, Sherwood, OR (US);
Seyang Park, Beaverton, OR (US);
Johanes H. Sukamto, Lake Oswego, OR (US);
Eric G. Webb, Salem, OR (US);
Jonathan D. Reid, Sherwood, OR (US);
Seyang Park, Beaverton, OR (US);
Johanes H. Sukamto, Lake Oswego, OR (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
A ruthenium-containing thin film is formed. Typically, the ruthenium-containing thin film has a thickness in a range of about from 1 nm to 20 nm. The ruthenium-containing thin film is annealed in an oxygen-free atmosphere, for example, in Nforming gas, at a temperature in a range of about from 100° C. to 500° C. for a total time duration of about from 10 seconds to 1000 seconds. Thereafter, copper or other metal is deposited by electroplating or electroless plating onto the annealed ruthenium-containing thin film. In some embodiments, the ruthenium-containing thin film is also treated by UV radiation.