The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Dec. 23, 2004
Tuochuan Huang, Saratoga, CA (US);
Daxing Ren, Pleasanton, CA (US);
Hong Shih, Walnut, CA (US);
Catherine Zhou, Fremont, CA (US);
Chun Yan, San Jose, CA (US);
Enrico Magni, Pleasanton, CA (US);
BI Ming Yen, Fremont, CA (US);
Jerome Hubacek, Fremont, CA (US);
Dae J. Lim, Fremont, CA (US);
Dougyong Sung, Fremont, CA (US);
Tuochuan Huang, Saratoga, CA (US);
Daxing Ren, Pleasanton, CA (US);
Hong Shih, Walnut, CA (US);
Catherine Zhou, Fremont, CA (US);
Chun Yan, San Jose, CA (US);
Enrico Magni, Pleasanton, CA (US);
Bi Ming Yen, Fremont, CA (US);
Jerome Hubacek, Fremont, CA (US);
Dae J. Lim, Fremont, CA (US);
Dougyong Sung, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Methods for cleaning an electrode assembly, which can be used for etching a dielectric material in a plasma etching chamber after the cleaning, comprise polishing a silicon surface of the electrode assembly, preferably to remove black silicon contamination therefrom.