The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2008
Filed:
Jun. 29, 2005
Alexander I. Ershov, San Diego, CA (US);
Alexander N. Bykanov, San Diego, CA (US);
Oleh Khodykin, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Alexander N. Bykanov, San Diego, CA (US);
Oleh Khodykin, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a COlaser. The drive laser redirecting mechanism may comprise a mirror.