The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2008
Filed:
Dec. 16, 2004
Hans-juergen Mann, Oberkochen, DE;
Stephan Muellender, Aalen, DE;
Johann Trenkler, Schwaebisch Gmuend, DE;
Hartmut Enkisch, Aalen, DE;
Hans-Juergen Mann, Oberkochen, DE;
Stephan Muellender, Aalen, DE;
Johann Trenkler, Schwaebisch Gmuend, DE;
Hartmut Enkisch, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A method of manufacturing a projection objective () of a microlithographic projection exposure apparatus (). The projection objective () comprises at least one mirror (Mto M) that each have a mirror support (to) and a reflective coating () applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating () is applied, the mirror supports (to) are provided with a desired surface deformation (). If the mirrors (Mto M) are not reflective for projection light without the coating (), measuring light is used that has another wavelength. Alternatively, two identical mirror supports () may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile