The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Mar. 31, 2004
Kazuhito Nakamura, Yamanashi, JP;
Cory Wajda, Hopewell Junction, NY (US);
Enrico Mosca, Ossining, NY (US);
Yumiko Kawano, Kofu, JP;
Gert Leusink, Saltpoint, NY (US);
Fenton R. Mcfeely, Ossining, NY (US);
Sandra G. Malhotra, Beacon, NY (US);
Kazuhito Nakamura, Yamanashi, JP;
Cory Wajda, Hopewell Junction, NY (US);
Enrico Mosca, Ossining, NY (US);
Yumiko Kawano, Kofu, JP;
Gert Leusink, Saltpoint, NY (US);
Fenton R. McFeely, Ossining, NY (US);
Sandra G. Malhotra, Beacon, NY (US);
Tokyo Electron Limited, Tokyo, JP;
International Business Machines Corp., Armonk, NY (US);
Abstract
A method for processing a substrate on a ceramic substrate heater in a process chamber. The method includes forming a protective coating on the ceramic substrate heater in the process chamber and processing a substrate on the coated substrate heater. The processing can include providing a substrate to be processed on the coated ceramic substrate heater, performing a process on the substrate by exposing the substrate to a process gas, and removing the processed substrate from the process chamber.