The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2008
Filed:
Aug. 31, 2005
Paola Dececco, Foster City, CA (US);
Bruno Schueler, San Jose, CA (US);
David Reed, Belmont, CA (US);
Michael Kwan, Sunnyvale, CA (US);
Dave Ballance, Cupertino, CA (US);
Paola deCecco, Foster City, CA (US);
Bruno Schueler, San Jose, CA (US);
David Reed, Belmont, CA (US);
Michael Kwan, Sunnyvale, CA (US);
Dave Ballance, Cupertino, CA (US);
ReVera Incorporated, Sunnyvale, CA (US);
Abstract
A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.