The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
May. 08, 2002
Chih-pen Yen, Kaohsiung, TW;
Jeng-yann Tsay, Tainan, TW;
Jeng-chiang Chuang, Kaohsiung, TW;
Cheng-fang Lin, Pingtung, TW;
Yung-mao Hsu, Tainan, TW;
Chih-Pen Yen, Kaohsiung, TW;
Jeng-Yann Tsay, Tainan, TW;
Jeng-Chiang Chuang, Kaohsiung, TW;
Cheng-Fang Lin, Pingtung, TW;
Yung-Mao Hsu, Tainan, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A system for controlling the flow of gases into a reaction chamber used in processing semiconductor devices includes a safety interlock feature that prevents inadvertent mixing of incompatible, reactive gases. The interlock feature is implemented in an interlock control circuit which operates a valve system for individually controlling the flow of separate gases into the chamber. The interlock circuit includes a series of relay switches and timers arranged to create a time delay between the initiation of flow of gases from separate sources into the chamber.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile