The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2008
Filed:
Jun. 18, 2004
Yu-liang Lin, Hsin-Chu, TW;
Henry Lo, Hsinchu, TW;
Chung-long Chang, Dou-Liu, TW;
Gorge Huang, Hsin-Chu, TW;
Tony LU, Hsin-chu, TW;
Gnesh Yeh, Hsin-Chu, TW;
Candy Liang, Kaohsiung, TW;
Chun-hsien Lin, Hsin-Chu, TW;
Mei Sheng Zhou, Singapore, SG;
Sunny Su, Douliou, TW;
Ai-sen Liu, Hsinchu, TW;
Cheng-lin Huang, Hsin-Chu, TW;
Li-jui Chen, Hsin-Chu, TW;
Shih Che Wang, Hsin-Chu, TW;
Yu-Liang Lin, Hsin-Chu, TW;
Henry Lo, Hsinchu, TW;
Chung-Long Chang, Dou-Liu, TW;
Gorge Huang, Hsin-Chu, TW;
Tony Lu, Hsin-chu, TW;
Gnesh Yeh, Hsin-Chu, TW;
Candy Liang, Kaohsiung, TW;
Chun-Hsien Lin, Hsin-Chu, TW;
Mei Sheng Zhou, Singapore, SG;
Sunny Su, Douliou, TW;
Ai-Sen Liu, Hsinchu, TW;
Cheng-Lin Huang, Hsin-Chu, TW;
Li-Jui Chen, Hsin-Chu, TW;
Shih Che Wang, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Co. Ltd., Hsin-Chu, TW;
Abstract
A method and apparatus for locally etching a substrate area the method including providing a substrate comprising a process surface; depositing a material layer over the process surface; and, applying a wet etchant to cover a targeted etching portion of the process surface while excluding an adjacent surrounding area to selectively etch the material layer overlying the targeted etching portion.