The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2008
Filed:
Mar. 30, 2006
Mark Ghinovker, Migdal Haemek, IL;
Michael Adel, Zichron Ya'akov, IL;
Walter Dean Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Dan Wack, Los Altos, CA (US);
Mark Ghinovker, Migdal Haemek, IL;
Michael Adel, Zichron Ya'akov, IL;
Walter Dean Mieher, Los Gatos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Dan Wack, Los Altos, CA (US);
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
An overlay mark for determining the relative shift between two or more successive layers of a substrate is disclosed. The overlay mark includes at least one test pattern for determining the relative shift between a first and a second layer of the substrate in a first direction. The test pattern includes a first set of working zones and a second set of working zones. The first set of working zones are disposed on a first layer of the substrate and have at least two working zones diagonally opposed and spatially offset relative to one another. The second set of working zones are disposed on a second layer of the substrate and have at least two working zones diagonally opposed and spatially offset relative to one another. The first set of working zones are generally angled relative to the second set of working zones thus forming an 'X' shaped test pattern.