The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2008
Filed:
Oct. 17, 2005
Shih-ming Chang, Hsin-Chu, TW;
Chih-cheng Chin, Taipei, TW;
Wen-chuan Wang, Taipei, TW;
Chi-lun LU, Changhua, TW;
Sheng-chi Chin, Hsin-Chu, TW;
Shih-Ming Chang, Hsin-Chu, TW;
Chih-Cheng Chin, Taipei, TW;
Wen-Chuan Wang, Taipei, TW;
Chi-Lun Lu, Changhua, TW;
Sheng-Chi Chin, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A patterning device for implementing a pattern on a substrate includes a main pattern feature and a sacrificial pattern feature. Both the main pattern feature and the sacrificial pattern feature are transferable to an overlying layer on the substrate. The sacrificial pattern feature is positioned a distance from the main pattern feature and is configured to have a dimension less than an etching bias of an etching process. The etching process is capable of transferring the main pattern feature to an underlying layer, such that the sacrificial pattern feature adjusts an etching behavior of the main pattern feature and is eliminated from the underlying layer.