The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2007

Filed:

Jul. 26, 2006
Applicants:

Igor V. Fomenkov, San Diego, CA (US);

William N. Partlo, Poway, CA (US);

Gerry M. Blumenstock, San Diego, CA (US);

Nortbert Bowering, San Diego, CA (US);

I. Roger Oliver, Wataupok, NZ;

Xiaojiang Pan, San Diego, CA (US);

Rodney D. Simmons, San Diego, CA (US);

Inventors:

Igor V. Fomenkov, San Diego, CA (US);

William N. Partlo, Poway, CA (US);

Gerry M. Blumenstock, San Diego, CA (US);

Nortbert Bowering, San Diego, CA (US);

I. Roger Oliver, Wataupok, NZ;

Xiaojiang Pan, San Diego, CA (US);

Rodney D. Simmons, San Diego, CA (US);

Assignee:

Cymer, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 65/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.


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