The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Jan. 18, 2007
Blaine R. Spady, Lincoln, NE (US);
John D. Heaton, Fremont, CA (US);
Robert Buchanan, Pleasanton, CA (US);
Richard A. Yarussi, San Francisco, CA (US);
Blaine R. Spady, Lincoln, NE (US);
John D. Heaton, Fremont, CA (US);
Robert Buchanan, Pleasanton, CA (US);
Richard A. Yarussi, San Francisco, CA (US);
Nanometrics Incorporated, Milpitas, CA (US);
Abstract
A metrology system includes a positioning system that produces linear and rotational motion between an imaging system and the wafer. The imaging system produces signals representing the image of the wafer in the field of view of the imaging system. A control system receives and processes the image signals, and generates corrected signals that compensate for rotational movement between the imaging system and the wafer. In response to the corrected signals, a monitor displays an image with the orientation of features on the wafer within the field of view unaffected by the rotational movement.