Company Filing History:
Years Active: 2001-2007
Title: The Innovations of Robert Buchanan
Introduction
Robert Buchanan is a notable inventor based in Pleasanton, CA (US). He has made significant contributions to the field of metrology and inspection systems, holding a total of 3 patents. His work focuses on improving the efficiency and accuracy of wafer measurement and inspection processes.
Latest Patents
One of Buchanan's latest patents is a metrology/inspection positioning system. This innovative system allows the imaging and measuring equipment to move relative to a wafer, eliminating the need for the wafer to be mounted on a precision stage. This advancement enables measurements to be taken without removing the wafer from the processing apparatus, thus not delaying the fabrication process. The system can perform measurements during necessary cool down periods, enhancing overall efficiency. Additionally, the alignment of the optical system is improved through pre-alignment based on edge detection and precise alignment using image recognition.
Another significant patent involves image control in a metrology/inspection positioning system. This system produces both linear and rotational motion between the imaging system and the wafer. It generates corrected signals that compensate for any rotational movement, ensuring that the displayed image maintains the correct orientation of features on the wafer. This innovation is crucial for accurate inspections and measurements.
Career Highlights
Buchanan's career is marked by his role at Nanometrics Inc., where he has been instrumental in developing advanced metrology solutions. His expertise in imaging systems and wafer inspection has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Buchanan has collaborated with talented individuals such as Richard A. Yarussi and Blaine R. Spady. These collaborations have contributed to the development of innovative technologies in the field of metrology.
Conclusion
Robert Buchanan's contributions to metrology and inspection systems have significantly advanced the efficiency of wafer processing. His innovative patents reflect his commitment to improving technology in this critical area.
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