The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2007

Filed:

Jan. 03, 2005
Applicants:

Guoguang LI, Fremont, CA (US);

Phillip Walsh, San Jose, CA (US);

Shuqiang Chen, Sunnyvale, CA (US);

Abdul Rahim Forouhi, Cupertino, CA (US);

Inventors:

Guoguang Li, Fremont, CA (US);

Phillip Walsh, San Jose, CA (US);

Shuqiang Chen, Sunnyvale, CA (US);

Abdul Rahim Forouhi, Cupertino, CA (US);

Assignee:

n&k Technology, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus and method for determining a physical parameter of features on a substrate by illuminating the substrate with an incident light covering an incident wavelength range Δλ, e.g., from 190 nm to 1000 nm, where the substrate is at least semi-transparent. A response light received from the substrate and the feature is measured to obtain a response spectrum of the response light. Further, a complex-valued response due to the feature and the substrate is computed and both the response spectrum and the complex-valued response are used in determining the physical parameter. A direct approximate phase measurement is provided when the response light is transmitted light.


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