The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
Aug. 21, 2003
Lingyi A. Zheng, Boise, ID (US);
Trung T. Doan, Pflugerville, TX (US);
Lyle D. Breiner, Meridian, ID (US);
Er-xuan Ping, Meridian, ID (US);
Ronald A. Weimer, Boise, ID (US);
David J. Kubista, Nampa, ID (US);
Kevin L. Beaman, Boise, ID (US);
Cem Basceri, Boise, ID (US);
Lingyi A. Zheng, Boise, ID (US);
Trung T. Doan, Pflugerville, TX (US);
Lyle D. Breiner, Meridian, ID (US);
Er-Xuan Ping, Meridian, ID (US);
Ronald A. Weimer, Boise, ID (US);
David J. Kubista, Nampa, ID (US);
Kevin L. Beaman, Boise, ID (US);
Cem Basceri, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
The present disclosure describes apparatus and methods for processing microfeature workpieces, e.g., by depositing material on a microelectronic semiconductor using atomic layer deposition. Some of these apparatus include microfeature workpiece holders that include gas distributors. One exemplary implementation provides a microfeature workpiece holder adapted to hold a plurality of microfeature workpieces. This workpiece holder includes a plurality of workpiece supports and a gas distributor. The workpiece supports are adapted to support a plurality of microfeature workpieces in a spaced-apart relationship to define a process space adjacent a surface of each microfeature workpiece. The gas distributor includes an inlet and a plurality of outlets, with each of the outlets positioned to direct a flow of process gas into one of the process spaces.