The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2007
Filed:
Aug. 03, 2004
Ching-yu Chang, I-Lan, TW;
Chien-hung Lin, Hsin-Chu, TW;
Chin-hsiang Lin, Hsin-chu, TW;
David LU, Hsin-chu, TW;
Horng-huei Tseng, Hsin chu, TW;
Burn-jeng Lin, Hsin-Chu, TW;
Ching-Yu Chang, I-Lan, TW;
Chien-Hung Lin, Hsin-Chu, TW;
Chin-Hsiang Lin, Hsin-chu, TW;
David Lu, Hsin-chu, TW;
Horng-Huei Tseng, Hsin chu, TW;
Burn-Jeng Lin, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A megasonic immersion lithography exposure apparatus and method for substantially eliminating microbubbles from an exposure liquid in immersion lithography is disclosed. The apparatus includes an optical system for projecting light through a mask and onto a wafer. An optical transfer chamber is provided adjacent to the optical system for containing an exposure liquid. At least one megasonic plate operably engages the optical transfer chamber for inducing sonic waves in and eliminating microbubbles from the exposure liquid.