The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2007
Filed:
May. 28, 2004
Tetsuo Kitabayashi, Fukuoka, JP;
Hiroaki Hori, Fukuoka, JP;
Takeshi Uchimura, Fukuoka, JP;
Noriaki Tateno, Fukuoka, JP;
Koh Fuwa, Kanagawa, JP;
Ken Maehara, Kanagawa, JP;
Tetsuo Kitabayashi, Fukuoka, JP;
Hiroaki Hori, Fukuoka, JP;
Takeshi Uchimura, Fukuoka, JP;
Noriaki Tateno, Fukuoka, JP;
Koh Fuwa, Kanagawa, JP;
Ken Maehara, Kanagawa, JP;
Ulvac, Inc., Kanagawa, JP;
Toto Ltd., Fukuoka, JP;
Abstract
An electrostatic chuck for attracting an insulative substrate to be processed, the electrostatic chuck comprising a dielectric layer having a first surface which attracts an insulative substrate, and a second surface on which are provided a plurality of electrodes, and an insulative support base plate fixing said dielectric layer. A distance between adjacent ones of the electrodes and the thickness of the dielectric layer are adjusted such that when a potential difference is established between the electrodes, a non-uniform electric field is formed in which the insulative substrate is partially polarized and attracted to the first surface by gradient force.