The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2007
Filed:
Sep. 30, 2004
Hideaki Yamasaki, Yamanashi, JP;
Kazuhito Nakamura, Guilderland, NY (US);
Yumiko Kawano, Yamanashi, JP;
Gert J. Leusink, Saltpoint, NY (US);
Fenton R. Mcfeely, Ossining, NY (US);
Paul Jamison, Hopewell Junction, NY (US);
Hideaki Yamasaki, Yamanashi, JP;
Kazuhito Nakamura, Guilderland, NY (US);
Yumiko Kawano, Yamanashi, JP;
Gert J. Leusink, Saltpoint, NY (US);
Fenton R. McFeely, Ossining, NY (US);
Paul Jamison, Hopewell Junction, NY (US);
Tokyo Electron Limited, Tokyo, JP;
International Business Machines Corp., Armonk, NY (US);
Abstract
A method for forming a passivated metal layer that preserves the properties and morphology of an underlying metal layer during subsequent exposure to oxygen-containing ambients. The method includes providing a substrate in a process chamber, exposing the substrate to a process gas containing a rhenium-carbonyl precursor to deposit a rhenium metal layer on the substrate in a chemical vapor deposition process, and forming a passivation layer on the rhenium metal layer to thereby inhibit oxygen-induced growth of rhenium-containing nodules on the rhenium metal surface.