The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
May. 21, 2002
Zhong Qiang Hua, Saratoga, CA (US);
Zhengquan Tan, Cupertino, CA (US);
Zhuang LI, San Jose, CA (US);
Kent Rossman, Orlando, FL (US);
Zhong Qiang Hua, Saratoga, CA (US);
Zhengquan Tan, Cupertino, CA (US);
Zhuang Li, San Jose, CA (US);
Kent Rossman, Orlando, FL (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber after depositing a layer of material over a substrate disposed in the chamber. In one embodiment the process comprises transferring the substrate out of the chamber; flowing a first gas into the substrate processing chamber and forming a plasma within the chamber from the first gas in order to heat the chamber; and thereafter, extinguishing the plasma, flowing an etchant gas into a remote plasma source, forming reactive species from the etchant gas and transporting the reactive species into the substrate processing chamber to etch the unwanted deposition build-up.