The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2006

Filed:

Feb. 28, 2003
Applicants:

Robert P. Meagley, Aloha, OR (US);

Michael D. Goodner, Hillsboro, OR (US);

Andrew W. Ott, Hillsboro, OR (US);

Grant M. Kloster, Lake Oswego, OR (US);

Michael L. Mcswiney, Hillsboro, OR (US);

Bob E. Leet, Scottsdale, AZ (US);

Inventors:

Robert P. Meagley, Aloha, OR (US);

Michael D. Goodner, Hillsboro, OR (US);

Andrew W. Ott, Hillsboro, OR (US);

Grant M. Kloster, Lake Oswego, OR (US);

Michael L. McSwiney, Hillsboro, OR (US);

Bob E. Leet, Scottsdale, AZ (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/10 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In one embodiment, the present invention includes introducing a precursor containing hydrocarbon substituents and optionally a second conventional or hydrocarbon-containing precursor into a vapor deposition apparatus; and forming a dielectric layer having the hydrocarbon substituents on a substrate within the vapor deposition apparatus from the precursor(s). In certain embodiments, at least a portion of the hydrocarbon substituents may be later removed from the dielectric layer to reduce density thereof.


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