The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2006
Filed:
Jun. 25, 2004
Yoshitaka Kai, Kudamatsu, JP;
Kenichi Kuwabara, Hikari, JP;
Takeo Uchino, Kudamatsu, JP;
Yasuhiro Nishimori, Kudamatsu, JP;
Takeshi Oono, Kudamatsu, JP;
Takeshi Shimada, Hikari, JP;
Yoshitaka Kai, Kudamatsu, JP;
Kenichi Kuwabara, Hikari, JP;
Takeo Uchino, Kudamatsu, JP;
Yasuhiro Nishimori, Kudamatsu, JP;
Takeshi Oono, Kudamatsu, JP;
Takeshi Shimada, Hikari, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The invention provides a semiconductor fabrication apparatus capable of preventing increase of carriage time of samples, deterioration of sample output, increase of footprint and increase of investment costs. The vacuum processing apparatus comprises a plurality of vacuum processing chambers for subjecting a sample to vacuum processing; a vacuum carriage for carrying the sample into and out of the vacuum processing chamber; a switchable chamber capable of being switched between atmosphere and vacuum for carrying the sample into and out of the vacuum processing chamber; a cassette support for supporting a plurality of cassettes and a controller for controlling carrying of the sample from a cassette through the switchable chambers, the vacuum carriage means into and out of the vacuum processing chamber. The vacuum processing chamber is equipped with an etching chamber and a critical dimension measurement chamber for critical dimension inspection of the sample.