The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2006
Filed:
Apr. 08, 2004
Jan Evert Van Der Werf, Waalre, NL;
Mark Kroon, Utrecht, NL;
Wilhelmus Cornelis Keur, Weert, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Hans Van Der Laan, Veldhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Erik Roelof Loopstra, Heeze, NL;
Jan Evert Van Der Werf, Waalre, NL;
Mark Kroon, Utrecht, NL;
Wilhelmus Cornelis Keur, Weert, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Hans Van Der Laan, Veldhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Erik Roelof Loopstra, Heeze, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength λsmaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λinto secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.