The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Apr. 02, 2004
Applicants:
Wen Chin Lin, Hsin-Chu, TW;
Denny Tang, Saratoga, CA (US);
Li-shyue Lai, Jhube, TW;
John Chern, Hsin Chu, TW;
Jyh-chyurn Guo, Hsinchu, TW;
Wan-yih Lien, Hsin-chu, TW;
Inventors:
Wen Chin Lin, Hsin-Chu, TW;
Denny Tang, Saratoga, CA (US);
Li-shyue Lai, Jhube, TW;
John Chern, Hsin Chu, TW;
Jyh-Chyurn Guo, Hsinchu, TW;
Wan-Yih Lien, Hsin-chu, TW;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and system is disclosed for directing charged particles on predetermined areas on a target semiconductor substrate. After aligning a wafer mask with a semiconductor wafer, with the wafer mask having one or more mask patterns thereon, the charged particles are directed to pass through the mask patterns to land on one or more selected areas on the semiconductor wafer.