The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Mar. 18, 2005
Applicants:
David R. Swenson, Georgetown, MA (US);
John J. Hautala, Beverly, MA (US);
Michael E. Mack, Manchester, MA (US);
Martin D. Tabat, Nashua, NH (US);
Matthew C. Gwinn, Winchendon, MA (US);
Inventors:
David R. Swenson, Georgetown, MA (US);
John J. Hautala, Beverly, MA (US);
Michael E. Mack, Manchester, MA (US);
Martin D. Tabat, Nashua, NH (US);
Matthew C. Gwinn, Winchendon, MA (US);
Assignee:
Epion Corporation, Billerica, MA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Apparatus and methods for improving processing of workpieces with gas-cluster ion beams and modifying the gas-cluster ion energy distribution in the GCIB. In a reduced-pressure environment, generating an energetic gas-cluster ion beam and subjecting the beam to increased pressure region.