The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2006
Filed:
Nov. 20, 2003
Martin Lowisch, Oberkochen, DE;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Koen Van Ingen Schenau, Eindhoven, NL;
Hans Van Der Laan, Veldhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Elaine Mccoo, Veldhoven, NL;
Uwe Mickan, Veldhoven, NL;
Martin Lowisch, Oberkochen, DE;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Koen Van Ingen Schenau, Eindhoven, NL;
Hans Van Der Laan, Veldhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Elaine McCoo, Veldhoven, NL;
Uwe Mickan, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Zastigmatism, Zspherical, and Zastigmatism.