The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2006

Filed:

Jan. 31, 2003
Applicants:

Yasunari Sohda, Kawasaki, JP;

Yoshinori Nakayama, Sayama, JP;

Osamu Kamimura, Kokubunji, JP;

Masato Muraki, Inagi, JP;

Masaki Takakuwa, Tokyo, JP;

Inventors:

Yasunari Sohda, Kawasaki, JP;

Yoshinori Nakayama, Sayama, JP;

Osamu Kamimura, Kokubunji, JP;

Masato Muraki, Inagi, JP;

Masaki Takakuwa, Tokyo, JP;

Assignees:

Hitachi, Ltd., Tokyo, JP;

Canon Kabushiki Kaisha, Tokyo, JP;

Advantest Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 7/00 (2006.01); G21K 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electron beam writing system, using discrete electron beams in which the interval of the beams is larger than the size of the beams, generates plural electron beams, on/off controls each of the electron beams according to pattern data to be written, and deflects the electron beams together, thereby performing writing on a wafer. One side of a unit writing area of the electon beams is larger than substantially twice the interval of the electron beams or substantially an integral multiple thereof.


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