The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2005
Filed:
Dec. 31, 2003
Hitesh Windlass, Hillsboro, OR (US);
Ebrahim Andideh, Portland, OR (US);
Daniel C. Diana, Portland, OR (US);
Mark Richards, Tigard, OR (US);
William C. Hicks, Gaston, OR (US);
Hitesh Windlass, Hillsboro, OR (US);
Ebrahim Andideh, Portland, OR (US);
Daniel C. Diana, Portland, OR (US);
Mark Richards, Tigard, OR (US);
William C. Hicks, Gaston, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Methods of depositing various metal layers adjacent to a ferroelectric polymer layer are disclosed. In one embodiment, a collimator may be used during a sputtering process to filter out charged particles from the material that may be deposited as a metal layer. In various embodiments, a metal layer may contain at least one of an intermetallic layer, an amorphous intermetallic layer, and an amorphized intermetallic layer.