The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 06, 2005

Filed:

Jun. 03, 2004
Applicants:

Kazuhiko Ito, Koshi-machi, JP;

Kazutoshi Ishimaru, Koshi-machi, JP;

Jun Ookura, Koshi-machi, JP;

Michio Kinoshita, Koshi-machi, JP;

Yuichi Douki, Koshi-machi, JP;

Inventors:

Kazuhiko Ito, Koshi-machi, JP;

Kazutoshi Ishimaru, Koshi-machi, JP;

Jun Ookura, Koshi-machi, JP;

Michio Kinoshita, Koshi-machi, JP;

Yuichi Douki, Koshi-machi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F007/00 ;
U.S. Cl.
CPC ...
Abstract

A substrate processing apparatus can align a substrate with a high precision and a high speed by monitoring a mark formed on a surface of the substrate; operating an amount of misalignment between the center of the substrate and a rotation center of a substrate support member; determining a presence of the misalignment and adjusting the substrate such that the center of the substrate coincides with the rotation center of the substrate support member.


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