The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Jun. 12, 2001
Stanislav V. Aleshin, Moscow, RU;
Marina M. Medvedeva, Moscow, RU;
Eugeni E. Egorov, Moscow, RU;
Gennady V. Belokopytov, Moscow, RU;
Paul G. Filseth, Los Gatos, CA (US);
Stanislav V. Aleshin, Moscow, RU;
Marina M. Medvedeva, Moscow, RU;
Eugeni E. Egorov, Moscow, RU;
Gennady V. Belokopytov, Moscow, RU;
Paul G. Filseth, Los Gatos, CA (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
Local images of photolithographic masks are assigned to classes based on similarity of functions of circuits formed by the images, so that all of the images of a class can be corrected by correcting one of the members. Boundaries of photolithographic masks are corrected for diffusion of light by moving regions based on process light intensity and proximity of close connections. Boundaries are also corrected for shifting of photoactive material in photoresists by calculating the amount of shift based on light intensities at pattern points.