The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
May. 29, 2002
Hung-ta Huang, Ilan, TW;
Hsueh-li Sun, Youkan, TW;
Juinn-jie Chang, Tainan, TW;
Stanley Huang, Tainan, TW;
Jih-churng Twu, Chung-Ho, TW;
Tom Tseng, Hsin-Chu, TW;
Hung-Ta Huang, Ilan, TW;
Hsueh-Li Sun, Youkan, TW;
Juinn-Jie Chang, Tainan, TW;
Stanley Huang, Tainan, TW;
Jih-Churng Twu, Chung-Ho, TW;
Tom Tseng, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd, Hsin Chu, TW;
Abstract
A method of monitoring and adjusting the position of a wafer with respect to an ion beam including setting the position of a wafer holder so that a wafer to be held therein is positioned at a tilt angle of 45 degrees and a twist angle of 45 degrees with respect to the path of an ion beam; positioning a n-type wafer without screen oxide in the wafer holder; implanting boron species into a region of the wafer at 160 KeV and a dose level of 5.0×10atoms/cm; periodically measuring the sheet resistivity of a implanted wafer and readjusting the wafer tilt angle when the sheet resistivity is greater than 30 ohms/square.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile