The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
Mar. 21, 2003
Youichi Ohsawa, Niigata-ken, JP;
Katsuhiro Kobayashi, Niigata-ken, JP;
Katsuya Takemura, Niigata-ken, JP;
Junji Tsuchiya, Niigata-ken, JP;
Kazunori Maeda, Niigata-ken, JP;
Youichi Ohsawa, Niigata-ken, JP;
Katsuhiro Kobayashi, Niigata-ken, JP;
Katsuya Takemura, Niigata-ken, JP;
Junji Tsuchiya, Niigata-ken, JP;
Kazunori Maeda, Niigata-ken, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Photoacid generators are provided by O-arylsulfonyl-oxime compounds having formula (1) wherein R is H, F, Cl, NO, alkyl or alkoxy, n is 0 or 1, m is 1 or 2, r is 0 to 4, r' is 0 to 5, k is 0 to 4, and G′ and G″ are S or —CH═CH—. Chemically amplified resist compositions comprising the photoacid generators have many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, and improved pattern profile after development. Because of high resolution, the compositions are suited for microfabrication, especially by deep UV lithography.