The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Mar. 08, 2003
Thomas A. Yager, Encinitas, CA (US);
William N. Partio, Poway, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Xiaojiang Pan, San Diego, CA (US);
John T. Melchior, San Diego, CA (US);
John Martin Algots, San Diego, CA (US);
Matthew Ball, Escondido, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Vladimir Fleurov, Escondido, CA (US);
Walter D. Gillespie, Poway, CA (US);
Holger K. Glatzel, San Diego, CA (US);
Leonard Lublin, Concord, MA (US);
Elizabeth Marsh, Melrose, MA (US);
Richard G. Morton, San Diego, CA (US);
Richard C. Ujazdowski, Poway, CA (US);
David J. Warkentin, Boston, MA (US);
R. Kyle Webb, Escondido, CA (US);
Thomas A. Yager, Encinitas, CA (US);
William N. Partio, Poway, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Xiaojiang Pan, San Diego, CA (US);
John T. Melchior, San Diego, CA (US);
John Martin Algots, San Diego, CA (US);
Matthew Ball, Escondido, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Vladimir Fleurov, Escondido, CA (US);
Walter D. Gillespie, Poway, CA (US);
Holger K. Glatzel, San Diego, CA (US);
Leonard Lublin, Concord, MA (US);
Elizabeth Marsh, Melrose, MA (US);
Richard G. Morton, San Diego, CA (US);
Richard C. Ujazdowski, Poway, CA (US);
David J. Warkentin, Boston, MA (US);
R. Kyle Webb, Escondido, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaFoptics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×10Watts/cmand with peak intensity or greater 3.5×10Watts/cmfor many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100×10J/cm. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaFsurface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.