William N Partio is a notable inventor based in Poway, California. He has made significant contributions to the field of extreme ultraviolet (EUV) light sources, holding a total of five patents. His work is primarily associated with Cymer, Inc., a company renowned for its advancements in photolithography technology.

Latest Patents

Among his latest patents is the "Extreme Ultraviolet Light Source." This invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in a vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit provides electrical pulses with sufficient energy and electrical potential to produce the EUV light at an intermediate focus at rates exceeding 5 Watts. In preferred embodiments designed by the applicants, in-band EUV light energy at the intermediate focus is 45 Watts, extendable to 105.8 Watts.

Another significant patent is the "Collector for EUV Light Source." This invention discloses an apparatus and method that may comprise a multi-layer reflecting coating forming an EUV reflective surface. This surface may include a spectral filter tuned to selectively reflect light in a band centered around a first preferred wavelength while significantly reducing the reflection of light at a second wavelength. For instance, it may be tuned to reflect maximally near the top of the reflectivity curve at around 13.5 nm while having significantly lower reflectivity at around 11 nm. The spectral filter may consist of a plurality of nested grazing angle of incidence shells comprising reflective surfaces with the multi-layer reflective coating.

Career Highlights

William N Partio's career at Cymer, Inc. has been marked by his innovative contributions to the field of EUV technology. His patents have played a crucial role in advancing the capabilities of photolithography, which is essential for semiconductor manufacturing.

Collaborations

Throughout his career, Partio has collaborated with notable colleagues, including Igor Vladimirovich Fomenkov and Palash P Das. These collaborations have further enhanced the development of cutting-edge technologies in the field.

Conclusion

William N Partio's work exemplifies the spirit of innovation in the realm of extreme ultraviolet light sources.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com