The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2005
Filed:
May. 02, 2001
Jeffrey J. Brown, Fishkill, NY (US);
Sadanand Vinayak Deshpande, Fishkill, NY (US);
David V. Horak, Essex Junction, VT (US);
Maheswaran Surendra, Croton-on-Hudson, NY (US);
Len Y. Tsou, New City, NY (US);
Qingyun Yang, Hopewell Junction, NY (US);
Chienfan Yu, Highland Mills, NY (US);
Ying Zhang, Yorktown Heights, NY (US);
Jeffrey J. Brown, Fishkill, NY (US);
Sadanand Vinayak Deshpande, Fishkill, NY (US);
David V. Horak, Essex Junction, VT (US);
Maheswaran Surendra, Croton-on-Hudson, NY (US);
Len Y. Tsou, New City, NY (US);
Qingyun Yang, Hopewell Junction, NY (US);
Chienfan Yu, Highland Mills, NY (US);
Ying Zhang, Yorktown Heights, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of fabricating an electronic chip on a wafer in which a first mask at a predetermined lower resolution is developed on the wafer and then etched under a first set of conditions for a predetermined period to achieve a mask that is below the resolution limit of current lithography. The etched mask is then used as a hard mask for etching material on a lower layer.