The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Apr. 04, 2003
Engelbertus Antonius Fransiscus Van DE Pasch, Oirschot, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Hendricus J. M. Meijer, Veldhoven, NL;
Daniel Galburt, Wilton, CT (US);
Erik Roelof Loopstra, Heeze, NL;
Engelbertus Antonius Fransiscus Van De Pasch, Oirschot, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Hendricus J. M. Meijer, Veldhoven, NL;
Daniel Galburt, Wilton, CT (US);
Erik Roelof Loopstra, Heeze, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a reflective lithographic projection apparatus, shifts in the image of a pattern of a mask in the scanning direction caused by variations in the position of the pattern surface of the mask along the optical axis are corrected by shifting of the relative position of the mask and/or the substrate in the scanning direction. Correction of the image rotation error may also be accomplished by rotation of the relative positions of the mask and/or the substrate about the optical axis. Variations in the position of the pattern surface of the mask along the optical axis may be determined by interferometers upon installation of the mask to the lithographic projection apparatus. The variations may be mapped and stored to provide control of the lithographic projection apparatus.