The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2004
Filed:
Aug. 21, 2003
Michael Barnes, San Ramon, CA (US);
John Holland, San Jose, CA (US);
Hongqing Shan, Cupertino, CA (US);
Bryan Y. Pu, San Jose, CA (US);
Mohit Jain, San Jose, CA (US);
Zhifeng Sui, Fremont, CA (US);
Michael D. Armacost, San Jose, CA (US);
Neil E. Hanson, Santa Clara, CA (US);
Diana Xiaobing Ma, Saratoga, CA (US);
Ashok K. Sinha, Palo Alto, CA (US);
Dan Maydan, Los Altos Hills, CA (US);
Other;
Abstract
A substrate processing apparatus has a chamber having a substrate support, gas distributor, gas energizer, and gas exhaust port. A process monitor is provided to monitor features in a first region of the substrate and generate a corresponding first signal, and to monitor features in a second region of the substrate and generate a second signal. A chamber controller receives and evaluates the first and second signals, and operates the chamber in relation to the signals. For example, the chamber controller can select a process recipe depending upon the signal values. The chamber controller can also set a process parameter at a first level in a first processing sector and at a second level in a second processing sector. The apparatus provides a closed control loop to independently monitor and control processing of features at different regions of the substrate.