Santa Clara, CA, United States of America

Neil E Hanson


Average Co-Inventor Count = 11.0

ph-index = 1

Forward Citations = 48(Granted Patents)


Company Filing History:

goldMedal1 out of 832,843 
Other
 patents

Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Neil E Hanson: Innovator in Substrate Processing Technology

Introduction

Neil E Hanson is a notable inventor based in Santa Clara, California. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique patent that enhances the efficiency and accuracy of substrate processing.

Latest Patents

Neil E Hanson holds a patent titled "Monitoring dimensions of features at different locations in the processing of substrates." This patent describes a substrate processing apparatus that includes a chamber with a substrate support, gas distributor, gas energizer, and gas exhaust port. The invention features a process monitor that tracks features in two distinct regions of the substrate, generating corresponding signals. A chamber controller evaluates these signals to optimize the processing conditions, allowing for independent monitoring and control of features at different substrate regions.

Career Highlights

Throughout his career, Neil E Hanson has demonstrated a commitment to advancing substrate processing technologies. His work has been instrumental in developing systems that improve the precision of substrate feature monitoring. This innovation has implications for various applications in semiconductor manufacturing and other related fields.

Collaborations

Neil has collaborated with several professionals in his field, including Michael S Barnes and John Patrick Holland. These collaborations have contributed to the refinement and implementation of his innovative technologies.

Conclusion

Neil E Hanson is a distinguished inventor whose work in substrate processing technology has paved the way for advancements in the industry. His patent reflects a significant step forward in the ability to monitor and control substrate processing effectively.

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